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resist-modeling

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Flowbudget / euvsimulator

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Open-source EUV lithography simulator in Python/PyTorch: Mo/Si mirror, thin-mask and RCWA mask diffraction, partially coherent imaging, chemically amplified resist (Dill, PEB, development) with stochastic LER/LWR, process window and calibration. Every physical default has a named source. Browser GUI and REST API. Apache-2.0.

python pytorch calibration optics physics-simulation lithography semiconductor stochastic-simulation rcwa fastapi photolithography euv computational-lithography resist-modeling process-window euv-lithography hopkins-imaging dill-model multilayer-optics line-edge-roughness
  • Updated Sep 12, 2026
  • Jupyter Notebook

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